Argon Co2 Weld humilis pressura aes pressura regulator
R57l aes pressura regulator
R57L Series Una pressura regulator quod adhibetur ad parva et medium fluxus Gas distribution system et idoneam ad inserta vapores ie argon, helium, oxygeni, CO2 etc.
Features of structuram
Single pressura reducendo pressura structuram
II "diaphragm
II "pressura MODULUS
Max. II pressura in pressura. 5Pain (250BAR, CCCLXII. 5psI)
Materia
Corpus: Brass
Bonnet: aes
Diaphragm: Neoprene
Stainer: Bronze
Applicatio
Non-Mors Gas
Purgate ratio
Test Laboratory
Industrialis fabricantium
| Exemplar non | Medium | Max. P. | P. out | Inelet METIOR | Outlet METIOR | INLENTUM | Outer Connection |
| R57LX, XV | o2 | 2.5 | 0.03 ~ 0.85 | N / est | 1.6 | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57LX-XV-N | 2.5 | 0.03 ~ 0.85 | N / est | 1.6 | M16-1.5RH (M) | M16-1.5RH (M) | |
| R57LX-XVII-n | 2.5 | 0.03 ~ 1.7 | N / est | 2.5 | 1/4 "NPT (F) | 1/4 "NPT (F) | |
| R57ly-XV | acetylene | 2.5 | 0.01-.1.1 | N / est | 0,25 | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57ly-XV-n | 2.5 | 0.01-.1.1 | N / est | 0,25 | M16-1.5RH (M) | M16-1.5RH (M) | |
| R57lf-8o | propaneo.ng | 2.5 | 0.02 ~ 0.56 | N / est | I | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57Lf-LXXX, n | 2.5 | 0.02 ~ 0.56 | N / est | I | M16-1.5RH (M) | M16-1.5RH (M) | |
| R57un, XV | Ar, et N2 | 2.5 | 0.03 ~ 0.85 | N / est | 1.6 | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57un-XVII | 2.5 | 0.03 ~ 1.7 | N / est | 2.5 | 1/4 "NPT (F) | 1/4 "NPT (F) | |
| R57LQ-XV | Aera | 2.5 | 0.03 ~ 0.85 | N / est | 1.6 | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57LQ-XVII | 2.5 | 0.03 ~ 1.7 | N / est | 2.5 | I / IV * NTP (F) | I / IV * NTP (F) | |
| R57LH-VIII | H2 | 2.5 | 0.02 ~ 0.85 | N / est | I | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57LH-XV | 2.5 | 0.03 ~ 0.85 | N / est | 1.6 | I / IV * NTP (F) | I / IV * NTP (F) | |
| R57LH-XVII | 2.5 | 0.03 ~ 1.7 | N / est | 2.5 | 1/4 "NPT (F) | 1/4 "NPT (F) | |
| R57LC, XV | CO2 | 2.5 | 0.03 ~ 0.85 | N / est | 1.6 | 1/4 "NPT (F) | 1/4 "NPT (F) |
| R57LC-XVII | 2.5 | 0.03 ~ 1.7 | N / est | 2.5 | 1/4 "NPT (F) | 1/4 "NPT (F) |
In integrated circuitu vestibulum applications, sunt includit integrated circuitu chip vestibulum, eget vapor depositione et Gas Applications, Etching et Gas Applications, doping et Gas Applications
