Application:
1.Laboratorium
2.gas chromatography
3.gas lasers
4.gas bus-bar
5.PETROCHEMICUS Industry
6.Testing Equipment
Design Feature:
Una-scaena pressura reducer
Materna et diaphragma usus durum sigillum formam
Corpus NPT: 1/4 "NTP (F)
Internum structuram facile purgare
Potest set Filtra
Can utor panel et murum adscendens
Product Parameenters:
Maximum INLETTUM | 500,3000psig |
Outlet pressura ranges | 0 XXV, 0 * L, 0 ~ 50,0 ~ 250,0 ~ 500psig |
Salus test pressura | 1,5 temporibus maximum iniecerunt pressura |
Operating temperatus | -40 ° F CLXV ° F / -40 ° C ° F |
Leakage Rate Rate | II * 10-8atm c / sec ipse |
CV valorem | 0,08 |
Materials:
Corpus | 316L, aes |
Bonnet | 316L. Aes |
Diafragm | 316L |
cohibitor | 316L (10mm) |
Sessio | Pctfe, Ptee, Ves |
Verno | 316L |
Plurger CALVA CORE | 316L |
Notitia
R11 | L | B | B | D | G | 00 | 02 | P |
Item | Corporis materia | Corpus foraminis | INLETUM | Outlet Pressura | Pressura Guage | Lymphaticus magnitudo | Outlet magnitudo | Marcium |
R11 | L: CCCXVI | A | D: MMM PSI | F: 0-500psig | G: Guage MPA | 00 1/4 "NPT (F) | 00 1/4 "NPT (F) | P: Panel adscendens |
B: Brass | B | E: MMCC PSI | G: 0-250PSIG | P: Psig / Bar Guage | I: 1/4 "NPT (m) | I: 1/4 "NPT (m) | R: cum subsidio valvae | |
D | F: D Psi | K: 0-50pisg | Latin: Non Guage | XXIII: CGGA330 | X: 1/8 "OD | N: Neque foramen acus | ||
G | L: 0-25psig | XXIV: CGGA350 | XI: 1/4 "OD | D: DiaphrGrGm CYMBALON | ||||
J | XXVII: CGGA580 | XII: 3/8 "OD | ||||||
M | XXVIII: CGGA660 | XV: 6mm od | ||||||
XXX: cgga590 | XVI: 8mm od | |||||||
LII: G5 / VIII "-RH (F) | ||||||||
LXIII: W21.8-14h (F) | ||||||||
LXIV: W21.8-14LH (F) |
In solaris cell applications specie includit solaris cell applications, crystallina Silicon solaris cellula productio processus et Gas applications, tenuis film solaris cellula productio processus et Gas Applications; In compositis semiconductor applications specie includit compositis semiconductor applications, Mocvd / DUXERIT productio processus et Gas Applications; In liquido Crystalli propono applications specie includit tft / LCD Applications, TFT in applicationem liquidis crystal ostentationem, quod includit applicationem of tft / lcd, productio processus of tft / LCD et Gas application; In application of optical fibra, quod includit applicationem of optical fibra et productionem processus of fibra preform et Gas application.