Ultra-summus puritas vapores sunt essentialis per semiconductor copia catena. In facto, quia typical FAB, summus puritas gasorum sunt maxima materia expense post Silicon ipsum. In vigilans de global chip penuriam, in industria est expanding citius, quam umquam - et in demanda ad excelsum castitatem gasorum est augendae.
Maxime plerumque solebat mole vapores in semiconductor vestibulum sunt NITROGENIUM, Helium, Hydrogenii et Argon.
Niterrogen
NITROGENIUM facit LXXVIII% de nostra atmosphaera et maxime abundat. Etiam fit ut chemica inerti et non-PROLIXUS. Sicut effectus, NITROGENIUM inventa est in via in numerum industries ut sumptus-effective inertes Gas.
Et semiconductor industria est a major dolor de NITROGENIUM. A modern semiconductor fabrica plant est expectat ut ad eum ad 50.000 cubicis metris nitrogen per horam. In semiconductor vestibulum, nitrogen acts ut generalis propositum inerting et purgans Gas, protegens sensitivo Silicon Wafers a reactive oxygeni et humorem in aere.
Helium
Helium est inerti Gas. Hoc modo, ut, sicut NITROGENIUM, Helium est chemica inerti - sed etiam habet addidit utilitatem excelsum scelerisque conductivity. Hoc praecipue utilis in semiconductor vestibulum, permittens eam ad efficienter mores calor a summo-navitas processus et auxilium defendas ex scelerisque damnum et unwanted eget.
Hydrogenium
Hydrogenium adhibetur extensive per electronics vestibulum processus et semiconductor productio est exceptio. In particulari, hydrogenii adhibetur:
Annealing: Silicon Wafers sunt typice calefieri ad altum temperaturis et tardius refrigeratum ad reparatione (annea) crystal structuram. Hydrogenium adhibetur transferre calor aequaliter ad laganum et adiuvaret in aedificationem crystallum structuram.
EpitAxy: Ultra-High Puritas Hydrogenii adhibetur ut a reducing agente in epitaxial depositionem of semiconductor materiae ut Silicon et Germania.
Depositione: Hydrogenii potest esse doped in Silicon films ut eorum nuclei structuram magis inordinatum, auxilium ad augendam resistentibus.
Plasma Purgato: Hydrogenium Pure Plasma est maxime effective in removere stagnum contagione a lux fontes usus in UV Lithography.
Argon
Argon est alius nobilis Gas, ita exhibet idem humilis reactivity ut NITROGENIUM et Helium. Sed Argon scriptor humilis ionization industria facit utile in semiconductor applications. Propter sui relative otium of ionization, Argon est communiter usus est ut prima plasma Gas pro Etch et depositionem reactiones in semiconductor vestibulum. Praeter hoc, Argon est etiam in excimer lasers pro UV Lithography.
Cur puritas rerum
Typice, progreditur in semiconductor technology fuisse per magnitudinem scaling, et novam generationem semiconductor technology propria est minorem pluma moles. Hoc cedit plures beneficia, magis transistors in dato volumine, emendare excursus, inferior potentia consummatio et citius switching.
Tamen, ut critica magnitudine decrescit, semiconductor cogitationes facti magis sophisticated. In mundo ubi positio individuum atomorum rebus, culpa tolerantia limina valde stricta. Sicut effectus, modern semiconductor processus eget processus vapores cum summa est puritas.
WOFLY is a high-tech enterprise specializing in gas application system engineering: electronic special gas system, laboratory gas circuit system, industrial centralized gas supply system, bulk gas (liquid) system, high purity gas and special process gas secondary piping system, chemical delivery system, pure water system to provide a full set of engineering and technical services and ancillary products from the technical consulting, overall planning, system design, selecting the equipment, Prefabricated components, in installation et constructione de project site, in altiore system temptationis, sustentacionem et alia supporting products in integrated modo.
Post tempus: Iul-11-2023