Wallensis linea una scaena 3000psi nitrogen Gas Regulator
Applicatio
Laboratory, Gas Chromatography, Gas lasers, Gas bus-bar, petrochemical industria, testis apparatu
Design Feature
Una-scaena pressura reducer
Materna et diaphragma usus durum sigillum formam
Corpus NPT: 1/4 "NTP (F)
Internum structuram facile purgare
Potest set Filters can utor a
Product Parameenters
| I | Maximum INLETTUM | 500,3000psig |
| 2 | Outlet pressura ranges | 0 XXV, 0 * L, 0 ~ 50,0 ~ 250,0 ~ 500psig |
| 3 | Salus test pressura | 1,5 temporibus maximum iniecerunt pressura |
| 4 | Operating temperatus | -40 ° F CLXV ° F / -40 ° C ° F |
| 5 | Leakage Rate Rate | II * 10-8atm c / sec ipse |
| 6 | CV valorem | 0,08 |
Materials of High Flow NITROGENIUM regulator
| I | Corpus | 316L, aes |
| 2 | Bonnet | 316L. Aes |
| 3 | Diafragm | 316L |
| 4 | cohibitor | 316L (10mm) |
| 5 | Sessio | Pctfe, Ptee, Ves |
| 6 | Verno | 316L |
| 7 | Plurger CALVA CORE | 316L |
OrdinatioNotitia
| R11 | L | B | B | D | G | 00 | 02 | P |
| Item | Corporis materia | Corpus foraminis | INLETUM | Outlet Pressura | Pressura Guage | Lymphaticus magnitudo | Outlet magnitudo | Marcium |
| R11 | L: CCCXVI | A | D: MMM PSI | F: 0-500psig | G: Guage MPA | 00 1/4 "NPT (F) | 00 1/4 "NPT (F) | P: Panel adscendens |
| B: Brass | B | E: MMCC PSI | G: 0-250PSIG | P: Psig / Bar Guage | I: 1/4 "NPT (m) | I: 1/4 "NPT (m) | R: cum subsidio valvae | |
| D | F: D Psi | K: 0-50pisg | Latin: Non Guage | XXIII: CGGA330 | X: 1/8 "OD | N: Neque foramen acus | ||
| G | L: 0-25psig | XXIV: CGGA350 | XI: 1/4 "OD | D: DiaphrGrGm CYMBALON | ||||
| J | XXVII: CGGA580 | XII: 3/8 "OD | ||||||
| M | XXVIII: CGGA660 | XV: 6mm od | ||||||
| XXX: cgga590 | XVI: 8mm od | |||||||
| LII: G5 / VIII "-RH (F) | ||||||||
| LXIII: W21.8-14h (F) | ||||||||
| LXIV: W21.8-14LH (F) |
PCR Laboratory Gas Piping System Includes PCR Laboratory Centralized Gas System System et Umbraticis Cylindri Gas System, quod potest videre diversas campester of requisitis ad tutum usum Gas. Centralis Gas copiam Piping System Project est maxime providere vexillum Gas cum stabilis quantitas et pressura ad analytica apparatu electus per test / officinarum ut ad salutem de repono et usum. Protegere analysts et testers a toxicus et nocivis vapores in experimenta. Secundum ad requisitis de National Latin, omnes vapores usus sunt condita in Gas repono locus, et centralized transmissio est intellexit formare centralis Gas copia ratio. Et ratio adoptat Pipeline Gas partus modi unius stuppam, una stuppa, multiple stuppa et multa stuppa, quae potest animadverto si potestate cum uno stuppam et switch potestate cum multiple stuppa et multiple stuppa; Et can animum vexillum Gas fluxus, pressura stabilitatem et valorem transferre sine mutatione, et occursum technica requisita analysis et testis apparatu ad Gas usus est.
